The system’s stable plasma enables long process durations for thick diamond growth, and its friendly user interface and data-logging features make for easy operation. The 6K provides in-situ monitoring of temperature by IR pyrometer and allows the connection of additional metrology tools including an optical emission spectrometer and interferometer for plasma diagnostics and film thickness monitoring. This system may be used in recipe-driven automatic, semiautomatic or manual mode, and it also offers remote Internet capability. It is field proven for high-volume production operation.
6 KW/10 KW System
- Excellent process stability and repeatability
- Operable in low- to high-power density plasma for accelerated growth rates
- Unique temperature control capabilities at high power densities
- Wide pressure operating range: 10-200 Torr
- Clamshell lid for easy-access substrate placement and chamber cleaning
- Recipe-driven automatic, semiautomatic and manual control